?url_ver=Z39.88-2004&rft_id=10.1088%2F0022-3727%2F48%2F4%2F045301&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.aufirst=Claudia&rft.aulast=Borri&rft.au=Borri%2C+Claudia&rft.issn=1361-6463&rft.pages=045301&rft.issue=4&rft.volume=48&rft.date=2015&rft.title=Journal+of+Physics+D%3A+Applied+Physics&rft.atitle=Topological+characterization+of+antireflective+and+hydrophobic+rough+surfaces%3A+are+random+process+theory+and+fractal+modeling+applicable%3F&rft.genre=article